A new approach to fabricating high density nanoarrays by nanocontact printing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 1860-1865

  Gu, Jian ^a   Xiao, Xiaoyin ^a   Takulapalli, Bharath R ^a   Morrison, Michael E ^a   Zhang, Peiming ^a   Zenhausern, Frederic ^a,b  

^a ARIZONA STATE UNIVERSITY   (United States)

^b Arizona State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT ACCURACIES; ARRAY PATTERNS; ATOMIC FORCE MICROSCOPES; CONTACT MASKS; FEATURE SIZES; HIGH DENSITIES; NANO ARRAYS; NANOCONTACT PRINTINGS; NEW APPROACHES; PRINTING TECHNIQUES; STREPTAVIDIN; ULTRA VIOLETS;

PRINTING;

EID: 57249103721     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2998754     Document Type: Article

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