Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2215-2219

  Myers, A M ^a   Lorusso, G F ^a   Kim, I ^a   Goethals, A M ^a   Jonckheere, R ^a   Hermans, J ^a   Baudemprez, B ^a   Ronse, K ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EXPERIMENTS; LASER PULSES; ULTRAVIOLET DEVICES;

COMPUTATIONALLY EFFICIENT; EXPERIMENTAL CHARACTERIZATIONS; EXPERIMENTAL DATUMS; EXPERIMENTAL VALIDATIONS; EXTREME ULTRAVIOLETS; FULLY INTEGRATED; PROCESS LINES; RIGOROUS SIMULATIONS; VOLUME MANUFACTURING;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 57249103674     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3013297     Document Type: Article

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