Quantification in dynamic SIMS: Current status and future needs

Applied Surface Science

Volumn 255, Issue 4, 2008, Pages 1364-1367

  Stevie, F A ^a   Griffis, D P ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

Complementary methods; Focused ion beam (FIB); Ion implantation; Quantification

Indexed keywords

ALUMINUM ALLOYS; ALUMINUM GALLIUM NITRIDE; FOCUSED ION BEAMS; GALLIUM ALLOYS; III-V SEMICONDUCTORS; ION SOURCES; SI-GE ALLOYS; SPECIMEN PREPARATION;

COMPLEMENTARY METHODS; COMPLEMENTARY TECHNIQUES; QUANTIFICATION; QUANTITATIVE INFORMATION; REPRODUCIBILITIES; THREE DIMENSIONS; THREE-DIMENSIONAL ANALYSIS; TIME-OF-FLIGHT INSTRUMENTS;

ION IMPLANTATION;

EID: 56449085408     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.041     Document Type: Article

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