Surface quantification by ion implantation through a removable layer

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 483-488

  Stevie, F A ^a   Roberts, R F ^a   McKinley, J M ^a   Decker, M A ^a   Granger, C N ^a   Santiesteban, R ^a   Hitzman, C J ^b  

^a NOKIA RESEARCH CENTER   (United States)

^b CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AUGER ELECTRON SPECTROSCOPY; CALCIUM; INTERFACES (MATERIALS); ION IMPLANTATION; MAGNESIUM; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING BORON; SENSITIVITY ANALYSIS; SUBSTRATES; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMETRY; TOTAL REFLECTION X RAY FLUORESCENCE (TXRF) PROCESS;

SEMICONDUCTOR JUNCTIONS;

EID: 0033711843     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591216     Document Type: Article

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