Quantitative secondary ion mass spectrometry (SIMS) of III-V materials

Materials Research Society Symposium - Proceedings

Volumn 692, Issue , 2002, Pages 543-548

  Van Lierde, P ^a   Tian, C ^a   Rothman, B ^a   Hockett, R A ^a  

^a CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DIFFUSION; ION IMPLANTATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SPUTTERING; X RAY DIFFRACTION ANALYSIS;

ION SPUTTERING;

SEMICONDUCTOR MATERIALS;

EID: 0036056016     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. In line SIMS tool for optoelectronic device manufacturing