Back side SIMS analysis of hafnium silicate

Applied Surface Science

Volumn 252, Issue 19, 2006, Pages 7179-7181

  Gu, C ^a   Stevie, F A ^a   Bennett, J ^b   Garcia, R ^a   Griffis, D P ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b ATDF   (United States)

Author keywords

Back side analysis; Hafnium silicate; High k dielectrics; SIMS

Indexed keywords

DIFFUSION; ION BOMBARDMENT; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES; SPUTTERING;

BACK SIDE ANALYSIS; HAFNIUM SILICATE; HIGH-K DIELECTRICS; SILICON SUBSTRATE;

HAFNIUM COMPOUNDS;

EID: 33747163304     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.099     Document Type: Article

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