Characteristics of ZnO epilayer on the post-annealed buffer layer on GaN/sapphire substrate by pulsed laser deposition

Applied Physics A: Materials Science and Processing

Volumn 93, Issue 3, 2008, Pages 697-703

  Sakano, Tatsunori ^a   Fukuoka, Hiroki ^a   Yata, Yoshihiro ^a   Saiki, Toshiharu ^a   Obara, Minoru ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; BUFFER LAYERS; CARRIER CONCENTRATION; CONCENTRATION (PROCESS); CRYSTAL GROWTH; ELECTROMAGNETIC WAVES; EPILAYERS; EPITAXIAL GROWTH; GALLIUM ALLOYS; GALLIUM NITRIDE; GROWTH TEMPERATURE; LIGHT EMISSION; LIGHT SOURCES; LUMINESCENCE; METALLIC FILMS; OPTICAL WAVEGUIDES; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING GALLIUM; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; ZINC ALLOYS; ZINC OXIDE;

ANNEALING EFFECTS; ANNEALING TECHNIQUES; BUFFER LAYER GROWTHS; CATHODE LUMINESCENCES; DEEP LEVELS; FLOW GROWTHS; GAN SUBSTRATES; GAN/SAPPHIRE; HALL MEASUREMENTS; LOW TEMPERATURES; MORPHO-LOGIES; PULSED LASERS; SMOOTH SURFACES; VISIBLE LUMINESCENCES; ZNO FILMS;

FILM GROWTH;

EID: 54549118147     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-008-4717-6     Document Type: Article

References (30)

1. Y. Segawa A. Ohtomo M. Kawasaki H. Koinuma Z.K. Tang P. Yu G.K.L. Wong 1997 Phys. Stat. Sol. B 202 669
2. B.B. Rao 2000 Mater. Chem. Phys. 64 62
3. J.W. Cook F. Schetzina 1996 J. Electron. Mater. 25 855
4. B. Yaglioglu Y.J. Huang H.Y. Yeom D.C. Paine 2006 Thin Solid Films 496 89
5. A. Ohtomo M. Kawasaki T. Koida K. Masubuchi H. Koinuma S. Yoshida T. Yasuda Y. Segawa 1998 Appl. Phys. Lett. 72 2466
6. T. Makino Y. Segawa M. Kawasaki A. Ohtomo R. Shinorki K. Tamura T. Yasuda H. Koinuma 2001 Appl. Phys. Lett. 78 1237
7. I.W. Kim S.J. Doh C.C. Kim J.H. Je J. Tashiro M. Yoshimoto 2005 Appl. Surf. Sci. 241 179
8. L. Wang Y. Pu W. Fang J. Dai C. Zheng C. Mo C. Xiong F. Jiang 2003 Thin Solid Films 491 323
9. Y.S. No T.W. Kim Y.S. Jung W.K. Choi 2006 Appl. Surf. Sci. 252 8121
10. B. Yaglioglu Y.J. Huang H.Y. Yeom D.C. Paine 2006 Thin Solid Films 496 89
11. P.T. Hsieh Y.C. Chen C.M. Wang Y.Z. Tsai C.C. Hu 2006 Appl. Phys. A 84 345
12. T. Zheng Z. Li J. Chen K. Shen K. Sun 2006 Appl. Surf. Sci. 252 8482
13. W.G. Han S.G. Kang T.W. Kim D.W. Kim W.J. Cho 2005 Appl. Surf. Sci. 245 384
14. Z.B. Fang Z.J. Yan Y.S. Tan X.Q. Liu Y.Y. Wang 2005 Appl. Surf. Sci. 241 303
15. J. Zhao L. Hu Z. Wang Z. Wang H. Zhang Y. Zhao X. Liang 2005 J. Cryst. Growth 280 455
16. D.C. Look B. Claflin 2004 Phys. Stat. Sol. B 241 624
17. A. Tsukazaki A. Ohtomo T. Onuma M. Ohtani T. Makino M. Sumiya K. Ohtani S.F. Chichibu S. Fuke Y. Segawa H. Ohno H. Koinuma M. Kawasaki 2005 Nature Mater. 4 42
18. H.J. Ko S.K. Hong Y. Chen T. Yao 2002 Thin Solid Films 409 153
19. P. Fons K. Iwata A. Yamada K. Matsubara S. Niki 2000 Appl. Phys. Lett. 77 1801
20. T. Okato T. Sakano M. Obara M.J. Kappers M.G. Blaraire 2007 Appl. Surf. Sci. 253 9185
21. N.E. Hsu W.K. Hung Y.F. Chen 2004 Appl. Phys. Lett. 96 4671
22. B. Lin Z. Fu Y. Jia 2001 Appl. Phys. Lett. 79 943
23. C.C. Lin S.Y. Chen S.Y. Cheng H.Y. Lee 2004 Appl. Phys. Lett. 84 5040
24. J.F. Rommeluere L. Svob F. Jomard J. Mimila-Arroyo A. Lusson V. Sallet Y. Marfaing 2003 Appl. Phys. Lett. 83 287
25. K.K. Kim H.S. Kim D.K. Hwang J.H. Lim S.J. Park 2003 Appl. Phys. Lett. 83 63
26. Y.R. Ryu S. Zhu D.C. Look J.M. Wrobel H.M. Jeong H.W. White 2004 J. Cryst. Growth. 216 330
27. F. Claeyssens A. Cheesman S.J. Henley M.N.R. Ashfold 2002 J. Appl. Phys. 92 6886
28. H. Amano N. Sawaki I. Akasaki 1986 Appl. Phys. Lett. 48 5 353
29. Y.S. No T.W. Kim Y.S. Jung W.K. Choi 2006 Appl. Surf. Sci. 252 8121
30. B. Yaglioglu Y.-J. Huang H.-Y. Yeom D.C. Paine 2006 Thin Solid Films 496 89