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Applied Physics A: Materials Science and Processing

Volumn 84, Issue 3, 2006, Pages 345-349

Structural and photoluminescence characteristics of ZnO films by room temperature sputtering and rapid thermal annealing process

(5) Hsieh, P T a Chen, Y C a Wang, C M b Tsai, Y Z b Hu, C C a

a NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

b CHENG SHIU UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOLUMINESCENCE; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SPUTTERING; X RAY DIFFRACTION; ZINC OXIDE;

ANNEALING TEMPERATURE; ROOM TEMPERATURE; SPUTTERING TECHNOLOGY; VISIBLE LIGHT EMISSION;

THIN FILMS;

EID: 33745143281 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-006-3620-2 Document Type: Article

Times cited : (42)

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