Absolute density distribution of H atoms in a large-scale microwave plasma reactor

Plasma Sources Science and Technology

Volumn 12, Issue 4, 2003, Pages 554-560

  Duan, X R ^a   Lange, H ^a   Meyer Plath, A ^a  

^a Inst Niedertemperatur Plasmaphys   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; FLUORESCENCE; HYDROGEN; LASER APPLICATIONS; MICROWAVES; PHOTONS; PLASMA DENSITY;

LARGE SCALE MICROWAVE PLASMA REACTOR; LASER INDUCED FLUORESCENCE; LITHIUM FLUORIDE; SPATIAL DISTRIBUTION; VOLUME TO SURFACE RATIO;

PLASMA SOURCES;

EID: 0344062699     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/12/4/307     Document Type: Article

References (24)

1. Miyazaki K, Kajiwara T, Uchino K and Muraoka K 1996 J. Vac. Sci. Technol. A 14 125-31
2. Anthony T 1990 The Physics and Chemistry of Carbides, Nitrides and Borides ed R Freer (Dordrecht: Kluwer) 133-58
3. Amorim J, Baravian G and Sultan G 1996 Appl. Phys. Lett. 68 1915-17
4. Czarnetzki U, Miyazaki K, Kajiwara T and Muraoka K, Maeda M and Döbele H F 1994 J. Opt. Sci. Am. B 11 2155-62
5. Deson J, Haloua F, Lalo C, Rousseau A and Veniard V 1994 J. Phys. D: Appl. Phys. 27 2320-8
6. St-Onge L and Moisan M 1994 Plasma Chem. Plasma Process. 14 87
7. Amorim J, Baravian G, Touzeau M and Jolly J 1994 J. Appl. Phys. 76 1487-93
8. Preppernau B L, Pearce K, Tserepi A, Wurzberg E and Miller T A 1995 Chem. Phys. 196 371-81
9. Gordiets B, Ferreira C M, Pinheiro M J and Richard A 1998 Plasma Sources Sci. Technol. 7 379-88
10. Lucht R P, Salmon J T, King G B, Sweeney D W and Laurendeau N M 1983 Opt. Lett. 8 365-7
11. Martin L R 1991 J. Appl. Phys. 70 5667
12. Miller T A 1986 J. Vac. Sci. Technol. A 4 1768-72
13. Takashima S, Hori M, Goto T, Ito M and Yoneda K 1999 Appl. Phys. Lett. 75 3929-31
14. Chen K-H, Chuang M-C, Penney C M and Banholzer W F 1992 J. Appl. Phys. 71 1485-93
15. Bokor J, Freeman R R, White J C and Storz R H 1981 Phys. Rev. A 24 612
16. Tung J H, Tang A Z, Salamo G J and Chan F T 1986 J. Opt. Soc. Am. B 3 837
17. Ohl A, Schleinitz W, Meyer-Sievers A, Becker A, Keller D, Schröder K and Conrads J 1999 Surf. Coat. Technol. 116-119 1006-1010
18. Bischel W K, Bokor J, Klinger D J and Rhodes C K 1979 IEEE J. Quantum Electron. 15 380
19. Meier U, Kohse-Hoinghaus K, Schafer L and Klages C 1990 Appl. Opt. 29 4993
20. Setser D W 1979 Reactive Intermediates in the Gas Phase: Generation and Monitoring ed D W Setser (New York: Academic)
21. Eckbreth A C 1996 Laser Diagnostics for Combustion Temperature and Species (New York: Gordon and Breach)
22. Chen K H, Chuang M C, Penny C H and Banholzer W F 1992 J. Appl. Phys. 71 1485
23. Duan X R 2000 Diagnostic study of hydrogen in large-sized microwave plasma reactors by two-photon absorption laser-induced fluorescence PhD Dissertation University Greifswald, Germany
24. Chabert P, Rousseau A, Gousset G and Leprince P 1998 J. Appl. Phys. 84 161-7