Material issues for nanoporous ultra low-k dielectrics

Proceedings of the IEEE 2004 International Interconnect Technology Conference

Volumn , Issue , 2004, Pages 219-221

  Char, Kookheon ^a   Cha, Bong Jun ^a   Kim, Suhan ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; DIELECTRIC FILMS; ELECTRONICS INDUSTRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROELECTRONICS; MOLECULAR WEIGHT; NANOSTRUCTURED MATERIALS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PERMITTIVITY; POLYCONDENSATION; THIN FILMS;

ALIPHATIC POROGENS; HYDROSILYLATION; MICROELECTRONICS INDUSTRY; NANOPOROUS LOW-K MATERIALS;

POROUS MATERIALS;

EID: 8644259299     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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