Acid-breakable resin-based chemical amplification positive resist for electron-beam mastering: Design and lithographic performance

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 7 B, 2004, Pages 5053-5060

  Sakamizu, Toshio ^a   Shiraishi, Hiroshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Acid breakable resin; Line edge roughness; Positive resist; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSIS; CONDENSATION; DIFFUSION; ELECTRON BEAM LITHOGRAPHY; MOLECULAR WEIGHT; PHENOLS; RESINS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

ACID-BREAKABLE RESIN; LINE-EDGE ROUGHNESS; MOLECULAR WEIGHT DISTRIBUTIONS; POSITIVE RESIST;

ELECTRON BEAMS;

EID: 5144231709     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5053     Document Type: Conference Paper

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