Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography

Journal of Photopolymer Science and Technology

Volumn 11, Issue 4, 1998, Pages 547-552

  Sakamizu, Toshio ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001210909     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.547     Document Type: Article

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