Fine pit pattern formation by EB-writing for a high density optical recording

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 223-230

  Hosaka, Sumio ^a,b   Koyanagi, Hajime ^a   Katoh, Keizou ^a   Isshiki, Fumio ^a   Suzuki, Tatsundo ^a   Miyamoto, Mitsuhide ^a   Arimoto, Akira ^a   Maeda, Takeshi ^a  

^a HITACHI LTD   (Japan)

^b GUNMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTROOPTICAL DEVICES; NEAR FIELD SCANNING OPTICAL MICROSCOPY; SCANNING;

ELECTRON BEAM (EB) WRITING;

OPTICAL RECORDING;

EID: 0035450030     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00480-4     Document Type: Article

References (4)