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Volumn 13, Issue 3, 2000, Pages 405-412
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Acid-breakable resin-based resist for nanofabrication electron-beam lithography
a
a
HITACHI LTD
(Japan)
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Author keywords
Acid breakable resin; Acid catalyzed fragmentation; Electron beam; Positive resist; Vinylether compound
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Indexed keywords
RESIN;
ARTICLE;
CATALYSIS;
DEGRADATION;
DEVICE;
ELECTRON BEAM;
GEL PERMEATION CHROMATOGRAPHY;
NANOPARTICLE;
SOLUBILITY;
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EID: 0034583971
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.13.405 Document Type: Article |
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Times cited : (10)
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References (13)
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