Thermodynamic stability of amorphous oxide films on metals: Application to aluminum oxide films on aluminum substrates

Physical Review B - Condensed Matter and Materials Physics

Volumn 62, Issue 7, 2000, Pages 4707-4719

  Jeurgens, L ^a   Sloof, W ^a   Tichelaar, F ^a   Mittemeijer, E ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000778775     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.62.4707     Document Type: Article

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