Survey on Roller-type Nanoimprint Lithography (RNIL) process

ICSMA 2008 - International Conference on Smart Manufacturing Application

Volumn , Issue , 2008, Pages 371-376

  Lan, Shuhuai ^a   Lee, Hyejin ^b   Ni, Jun ^c   Lee, Soohun ^d   Lee, Moongu ^d  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b Korea Institute of Industrial Technology   (South Korea)

^c The Department of Civil and Environmental Engineering   (United States)

^d Ajou University   (South Korea)

Author keywords

Nanoimprint lithography (NIL); Roller type nanoimprint lithography (RNIL)

Indexed keywords

ELECTRONICS ENGINEERING; FLOW CONTROL; ROLLERS (MACHINE COMPONENTS);

COST MANUFACTURING; HIGH RESOLUTIONS; HIGH THROUGHPUTS; INTERNATIONAL CONFERENCES; LITERATURE REVIEWS; LITHOGRAPHY PROCESSES; NANO IMPRINTS; NANO SCALING; NANOIMPRINT LITHOGRAPHY (NIL); ROLLER-TYPE NANOIMPRINT LITHOGRAPHY (RNIL); SMART MANUFACTURING;

NANOIMPRINT LITHOGRAPHY;

EID: 50249138210     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSMA.2008.4505555     Document Type: Conference Paper

References (25)

1. L. Jay Guo, "Nanoimprint Lithography: Methods and Material Requirements," Advanced Material, Vol. 19, pp. 495-513, 2007.
2. B. D. Gates, et al. "New Approaches to Nanofabrication: Molding, Printing, and Other Techniques," Chemical Reviews, Vol. 105 pp. 1171, 2005.
3. C.M. Sotomayor Torres et al. "Nanoimprint lithography: an alternative nanofabrication approach," Materials Science and Engineering C, Vol. 23, pp. 23-31, 2003.
4. Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom, "Imprint of sub-25 nm vias and tenches in polymers," Applied Physics Letters, V ol. 67 No. 21, pp.3114-3116, 1995.
5. Stephen Y. Chou, Peter R. Krauss, "Imprint Lithography with Sub-10 nm Feature Size and High Throughput" Microeleetronic Engineering, Vol.35, pp. 237-240, 1997.
6. M.Bender et al. "Fabrication of nanostructures using a UV-based imprint technique," Microelectronic Engineering, Vol. 53, pp. 233-236, 2000
7. M. Otto, M.Bender, B. Hadam, B. Spangenberg, H. Kurz. "Characterization and application of a UV-based imprint technique," Microelectronic Engineering, Vol. 57-58, pp. 361-366, 2000.
8. M. Colburn, et al. "Step-and-flash Imprint Lithography: A New Approach to High Resolution Patterning," Proc. qf SWE, Vol.3676 379, 1999.
9. Y. Xia, GM. Whitesides, "Soft Lithography," Angewandte Chemie International Edition, Vol.37 pp. 550-575, 1998.
10. A. Pepin, et al, "Nanoimprint lithography for the fabrication of DNA electrophoresis chips," Microelectronic Engineering, Vol. 61-62, pp. 927-932, 2002.
11. M. Nilsson and B. Heidari, "Breaking the Limit-Patterned Media for 100 Gbits and beyond," Obducat, Malmo, Sweden.
12. Y. K. Park, Hubert Kostal, "Nano-Oprics Redenfine Rules for Oprical Processing," Communication System Design, pp. 23-26, Aug. 2002.
13. C. Clavijo Cedeno, et al, "Nanoimprint lithography for organic electronics," Microelectronic Engineering, Vol. 61-62, pp. 25-31, 2002.
14. Hua Tan, Andrew Gilbertson, Stephen Y. Chou, "Roller nanoimprint lithography," Journal of Vacuum Science & Technology B, Vol. 16, No. 6, pp. 3926-3928, 1998.
15. Jack Hou,Yajuan Chen,Ying-Syi Li, et al. "Reliability and performance of flexible electrophoretic displays by roll-to-roll manufacturing processes," SID'04 Digest, Seattle, USA.-SID, pp. 1066-1069, 2004.
16. Wang Xiaojia, Zang HongMei, Peter Li, "Roll-to-roll manufacturing process for full color electrophoretic film," SID'06 Digest,San Francisco, CA:SID, pp. 1587-1889, 2006.
17. G. P Grawford. et al. "Roll-to-Roll Manufacturing of Flexible Displays," Flexible Flat Panel Displays, pp. 410-445, 2005.
18. Evan Schwartz, "Roll to Roll Processing for Flexible Electronics," Cornell University MSE 542: Flexible Electronics, May 11, 2006.
19. Suho Ahn et al. "Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns," Applied Physics Letters, Vol. 89, 213101, 2006.
20. Tapio Makela et al. "Continuous roll to roll nanoim printing of inherently conducting polyaniline," Microelectronic Engineering, Vol. 84, pp. 877-879, 2007.
21. T. Haatainen et al. "Nickel stamp fabrication using step & stamp imprint lithography," Microelectronic Engineering, Vol. 83, pp. 948-950, 2006.
22. www.aist.go.jp
23. Po-Ching Kao et al. "Fabrication of the patterned flexible OLEDs using a combined roller imprinting and photolithography method," Proceedings of 2005 5th IEEE Conference on Nanotechnology, Nagoya, Japan, vol. 2 pp. 693-695, 2005.
24. Soon-min Seo, Tae-il Kim, Hong H. Lee, "Simple fabrication of nanostructure by continuous rigiflex imprinting," Microelectronic Engineering, Vol. 84, pp. 567-572, 2007.
25. S.J. Choi, P.J. Yoo, S.J. Beak, T.W. Kim, H.H. Lee, J. "An Ultraviolet-Curable Mold for Sub-100-nm Lithography," J. of the American Chemical Society Vol. 126, pp. 7744, 2004.