Well-ordered v2O5(001) thin films on au(111): Growth and thermal stability

Journal of Physical Chemistry C

Volumn 112, Issue 31, 2008, Pages 11835-11846

  Guimond, Sébastien ^a,b   Sturm, Jacobus M ^a   Göbke, Daniel ^a   Romanyshyn, Yuriy ^a   Naschitzki, Matthias ^a   Kuhlenbeck, Helmut ^a   Freund, Hans Joachim ^a  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DESORPTION; ELECTRON DIFFRACTION; EMISSION SPECTROSCOPY; GOLD; IMAGING TECHNIQUES; MICROSCOPIC EXAMINATION; NONMETALS; OXIDE FILMS; OXIDES; OXYGEN; SCANNING TUNNELING MICROSCOPY; TEMPERATURE PROGRAMMED DESORPTION; THERMODYNAMIC STABILITY; THICK FILMS; TRANSITION METALS; VANADIUM; VANADIUM COMPOUNDS;

AU (1 1 1); LOW-ENERGY ELECTRON DIFFRACTION; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURES; PHOTOEMISSION SPECTROSCOPY; THERMAL STABILITY; VANADIUM OXIDE THIN FILMS;

ABSORPTION SPECTROSCOPY;

EID: 49649099747     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp8011156     Document Type: Article

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