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Surface Science

Volumn 496, Issue 1-2, 2002, Pages 64-72

Adsorption of molecular and atomic hydrogen on vacuum-cleaved V2O5(0 0 1)

(8) Tepper, B a Richter, B a Dupuis, A C a Kuhlenbeck, H a Hucho, C b Schilbe, P c Bin Yarmo, M A d Freund, H J a

a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT (Germany)

b PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK (Germany)

c FREIE UNIVERSITÄT BERLIN (Germany)

d UNIVERSITI KEBANGSAAN MALAYSIA (Malaysia)

Author keywords

Angle resolved photoemission; Chemisorption; Electron energy loss spectroscopy (EELS); Hydrogen atom; Hydrogen molecule; Phonons; Vanadium oxide; X ray photoelectron spectroscopy

Indexed keywords

ABSORPTION; CHEMISORPTION; ELECTRON ENERGY LOSS SPECTROSCOPY; FERMI SURFACE; PHONONS; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; SINGLE CRYSTALS; ULTRAVIOLET SPECTROSCOPY; VANADIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC HYDROGEN;

HYDROGEN;

EID: 0036132987 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01607-7 Document Type: Article

Times cited : (69)

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