Two-dimensional recrystallisation processes of nanometric vanadium oxide thin films grown by atomic layer chemical vapor deposition (ALCVD) evidenced by AFM

Applied Surface Science

Volumn 252, Issue 16, 2006, Pages 5917-5925

  Groult, H ^a   Balnois, E ^a,b   Mantoux, A ^a   Le Van, K ^a   Lincot, D ^a  

^a CNRS   (France)

^b UNIVERSITÉ DE BRETAGNE SUD   (France)

Author keywords

AFM; Atomic layer chemical vapor deposition; Film growth; Vanadium oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; RECRYSTALLIZATION (METALLURGY); SURFACE PROPERTIES; VANADIUM COMPOUNDS;

AFM; ATOMIC LAYER CHEMICAL VAPOR DEPOSITION; COHERENCE DOMAINS; VANADIUM OXIDE;

THIN FILMS;

EID: 33746803205     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.08.014     Document Type: Article

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