Influence of magnetron deposition parameters on the stoichiometry of sputtered V2O5 films

Surface and Interface Analysis

Volumn 36, Issue 8, 2004, Pages 1163-1166

  Silversmit, G ^a   Poelman, H ^a   De Gryse, R ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

DC magnetron sputtering; Oxidation state; V 2p core level; Vanadium oxides; XPS

Indexed keywords

CHARGE TRANSFER; MAGNETRON SPUTTERING; OXIDATION; POSITIVE IONS; SILICON; STOICHIOMETRY; SUBSTRATES; VANADIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

DC MAGNETRON SPUTTERING; OXIDATION STATE; V 2P CORE LEVEL; VANADIUM OXIDES;

THIN FILMS;

EID: 4444328761     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1866     Document Type: Conference Paper

References (15)

1. Appl Cat. A 1997; 157: 1 (complete issue).
2. EUROCAT, Catal. Today 1994; 20:1 (complete issue).
3. Wachs IE, Weckhuysen BM. Appl. Cat. A 1997; 157: 67.
4. Biener J, Bäumer M, Wang J, Madix RJ. Surf. Sci. 2000; 450: 12.
5. Møller PJ, Li ZS, Egebjerg T, Sambi M, Granozzi G. Surf. Sci. 1998; 402-404: 719.
6. Robba D, Ori DM, Sangalli P, Chiarello G, Depero LE, Parmigiani F. Surf. Sci. 1997; 380:311.
7. Benmoussa M, Ibnouelghazi E, Bennouna A, Ameziane EL. Thin Solid Films 1995; 265; 22.
8. Kusano E, Theil JA, Thornton JA. J. Vac. Sci. Technol. A 1998; 6(3): 1663.
9. Haemers J. Bull. Soc. Chim Belges 1970; 79: 473.
10. http://www.phy.cuhk.edu.hk/~surface/XPSPEAK/.
11. Mendialdua J, Casanova R, Barbaux Y. J. Electron Spectrosc. Relat. Phenom. 1995; 71:249.
12. Silversmit G, Depla D, Poelman H, De Gryse R. J. Electron. Spectrosc. Relat. Phenom. 2004; 135: 167.
13. Bondarenka V, Grebinskij S, Kaciulis S, Mattogno G, Mickevicius S, Tvardauskas H, Volkov V, Zakharova G. J. Electron Spectrosc. Relat. Phenom. 2001; 120:131.
14. Desimoni E, Casella GI, Morone A, Salvi AM. Surf. Interface Anal 1990; 15: 627.
15. Zimmerman R, Claessen R, Reirtert F, Steiner P, Hüfner S. J. Phys.: Condens. Matter 1998; 10: 5697.