Surface chemical modification of InN for sensor applications

Journal of Applied Physics

Volumn 96, Issue 6, 2004, Pages 3577-3579

  Lu, Hai ^a   Schaff, William J ^a   Eastman, Lester F ^a  

^a Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HALL MEASUREMENTS; ISOPROPANOL TREATMENTS; NOMARSKI OPTICAL MICROSCOPES; VAN DER PAUW GEOMETRY;

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; CHEMICAL MODIFICATION; EVAPORATION; HALL EFFECT; HYDROCARBONS; LIGHT EMITTING DIODES; METHANOL; OPTICAL MICROSCOPY; PHOTOLUMINESCENCE; SENSORS; SOLVENTS; SURFACE CHEMISTRY; SURFACE TREATMENT; THIN FILMS; WATER;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 4944266687     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1767608     Document Type: Article

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