Comparative study of Cu-precursors for 3D focused electron beam induced deposition

Journal of the Electrochemical Society

Volumn 151, Issue 9, 2004, Pages

  Luisier, A ^a   Utke, I ^a   Bret, T ^a   Cicoira, F ^a   Hauert, R ^b   Rhee, S W ^c   Doppelt, P ^d   Hoffmann, P ^a  

^a EPFL   (Switzerland)

^b EMPA Dübendorf ^*  (Germany)

^c Pohang University of Science and Technology (POSTECH)   (South Korea)

^d CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DESORPTION; DISSOCIATION; ELECTRODES; ELECTRON BEAMS; MICROELECTRONICS; SCANNING ELECTRON MICROSCOPY;

CHEMICAL STABILITY; ELECTRON BEAM INDUCED DEPOSITION; FOCUSED ELECTRON BEAM (FEB); PRECURSORS;

COPPER;

EID: 4944260756     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1779335     Document Type: Article

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