Stress control of a-SiC films deposited by dual source dc magnetron sputtering

Vacuum

Volumn 80, Issue 7 SPEC. ISS., 2006, Pages 744-747

  Inoue, S ^a   Namazu, T ^a   Tawa, H ^a   Niibe, M ^a   Koterazawa, K ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Amorphous SiC; dc sputtering; Hardness; Internal stress; X ray optical filter

Indexed keywords

ANNEALING; DEPOSITION; GEOMETRY; HARDNESS; RESIDUAL STRESSES; SILICON NITRIDE; SPUTTERING; TENSILE STRESS;

AMORPHOUS SIC; DC SPUTTERING; POST-DEPOSITION ANNEALING; X-RAY OPTICAL FILTER;

THIN FILMS;

EID: 33646546709     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.11.041     Document Type: Article

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