Dual DC magnetron cathode co-deposition of (Al,Ti) and (Al,Ti,N) thin films with controlled depth composition

Vacuum

Volumn 81, Issue 11-12, 2007, Pages 1503-1506

  Nunes, Y ^a   Wemans, A ^a   Marques, H P ^a   Marques, C ^b,c   Ferreira, Q ^a   Teodoro, O M N D ^a   Alves, E ^b,c   Maneira, M J P ^a  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^c CENTRO DE FÍSICA NUCLEAR DA UNIVERSIDADE DE LISBOA   (Portugal)

Author keywords

Codeposition; Depth composition; Magnetron sputtering

Indexed keywords

DEPOSITION; ELECTRIC DISCHARGES; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CODEPOSITION; DEPTH COMPOSITION; METAL ABUNDANCES;

THIN FILMS;

EID: 34547873897     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.04.027     Document Type: Article

References (6)

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