Advancing the ion beam thin film planarization process for the smoothing of substrate particles

Microelectronic Engineering

Volumn 77, Issue 3-4, 2005, Pages 369-381

  Mirkarimi, P B ^a   Spiller, E ^a   Baker, S L ^a   Robinson, J C ^a   Stearns, D G ^b   Liddle, J A ^c   Salmassi, F ^c   Liang, T ^d   Stivers, A R ^d  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b OS Associates   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

Defect; Extreme ultraviolet lithography; Film; Mask; Microelectronic manufacturing; Multilayer; Reticle; Smoothing

Indexed keywords

COATINGS; DEFECTS; FILMS; ION BEAMS; LITHOGRAPHY; MICROELECTRONICS; MULTILAYERS; REFLECTION; SUBSTRATES;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MASK; MICROELECTRONIC MANUFACTURING; PLANARIZATION; RETICLE; SMOOTHING;

THIN FILMS;

EID: 15344348442     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.098     Document Type: Article

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