SCOPUS 정보 검색 플랫폼

Small

Volumn 4, Issue 7, 2008, Pages 920-924

Polyethylene glycol as a novel resist and sacrificial material for generating positive and negative nanostructures

(5) Sanedrin, Raymond G a Huang, Ling a Jang, Jae Won a Kakkassery, Joseph a Mirkin, Chad A a

a NORTHWESTERN UNIVERSITY (United States)

Author keywords

Dip pen nanolithography; Nanostructures; Polyethylene glycol; Resists; Wet chemical etching

Indexed keywords

ETHYLENE GLYCOL; GLYCOLS; NANOLITHOGRAPHY; NANOSTRUCTURES; THERMOPLASTICS; TURBULENT FLOW;

CANTILEVER ARRAYS; DIP PEN NANOLITHOGRAPHY (DPN); PROTECTIVE LAYERS;

POLYETHYLENE GLYCOLS;

ACETONITRILE; ACETONITRILE DERIVATIVE; MACROGOL DERIVATIVE; NANOMATERIAL; POLYMER; WATER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; EQUIPMENT DESIGN; INSTRUMENTATION; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY;

ACETONITRILES; EQUIPMENT DESIGN; MATERIALS TESTING; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; NANOTECHNOLOGY; POLYETHYLENE GLYCOLS; POLYMERS; WATER;

EID: 48249130430 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200701089 Document Type: Article

Times cited : (20)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.