Phase of molecular ink in nanoscale direct deposition processes

Journal of Chemical Physics

Volumn 124, Issue 2, 2006, Pages

  Cho, Narae ^a   Ryu, Seol ^b   Kim, Byeongju ^a   Schatz, George C ^b   Hong, Seunghun ^a  

^a Seoul National University   (South Korea)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITED PATTERNS; MOLECULAR INK; PATTEN GROWTH RATES; QUALITATIVE EXPLANATION;

ATOMIC FORCE MICROSCOPY; GROWTH KINETICS; INK; NANOTECHNOLOGY; PHASE TRANSITIONS; SOLVENTS;

DEPOSITION;

INK; NANOPARTICLE;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL MODEL; CHEMISTRY; DIFFUSION; EQUIPMENT DESIGN; INSTRUMENTATION; METHODOLOGY; NANOTECHNOLOGY; PHYSICAL CHEMISTRY; STATISTICAL MODEL; SURFACE PROPERTY; TEMPERATURE; THEORETICAL MODEL; TIME;

ADSORPTION; CHEMISTRY, PHYSICAL; DIFFUSION; EQUIPMENT DESIGN; INK; MICROSCOPY, ATOMIC FORCE; MODELS, CHEMICAL; MODELS, STATISTICAL; MODELS, THEORETICAL; NANOPARTICLES; NANOTECHNOLOGY; SURFACE PROPERTIES; TEMPERATURE; TIME FACTORS;

EID: 33745130110     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2147139     Document Type: Article

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