Dip-pen nanolithography using colloidal inks

International Journal of Nanoscience

Volumn 4, Issue 5-6, 2005, Pages 921-934

  John, Neena Susan ^a   Gundiah, Gautam ^a   John Thomas, P ^a   Kulkarni, G U ^a   Heun, S ^b  

^a JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

^b LABORATORIO TASC   (Italy)

Author keywords

AFM; Colloidal inks; DPN; LEEM; XPEEM

Indexed keywords

ATOMIC FORCE MICROSCOPY; COLLOIDS; MAGNETIC PROPERTIES; MICA; SILICON;

COLLOIDAL INKS; DPN; XPEEM;

NANOTECHNOLOGY;

EID: 32944461810     PISSN: 0219581X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0219581X05003887     Document Type: Conference Paper

References (40)

1. C. N. R. Rao and A. K. Cheetam, J. Mater. Chem. 11, 2887 (2001).
2. C. N. R. Rao, G. U. Kulkarni, P. J. Thomas and P. P. Edwards, Chem. Eur. J. 8, 28 (2002);
3. C. N. R. Rao, G. U. Kulkarni, P. J. Thomas and P. P. Edwards, Chem. Soc. Rev. 29, 27 (2000).
4. . F. Remade and R. D. Levine, Chem. Phys. Chem. 2, 20 (2001);
5. J. Jortner and M. Ratner (eds.), Molecular Electronics (Blackwell Scientific, London, 1997);
6. D. L. Feldheim and C. D. Keating, Chem. Soc. Rev. 27, 11 (1998).
7. J. Grunes, J. Zhu and G. A. Somorjai, Chem. Commun., 2257 (2003).
8. J.-F. Liu, L.-G. Zhang, N. Gu, J.-Y. Ren, Y.-P. Wu, Z.-H. Lu, P. S. Mao and D.-Y. Chen, Thin Solid Films 327-329, 176 (1998);
9. J. Liu, T. Lee, D. B. Janes, B. L. Walsh, M. R. Melloch, J. M. Reifenberger and R. P. Andres, Appl. Phys. Lett. 77, 373 (2000);
10. H. X. He, H. Zhang, Q. G. Li, T. Zhu, S. F. Y. Li and Z. F. Liu, Langmuir 16, 3846 (2000).
11. Y. Xia and G. M. Whitesides, Angew. Chem. Int. Ed. 37, 550 (1998).
12. C. L. Haynes and R. P. Van Duyne, J. Phys. Chem. B 105, 5599 (2001).
13. M. B. Ali, T. Ondarcuhu, M. Brust and C. Joachim, Langmuir 18, 872 (2002).
14. J. C. Garno, Y. Yang, N. A. Amro, S. Cruchon-Dupeyrat, S. Chen and G.-Y. Liu, Nano Lett. 3, 389 (2003).
15. G.-Y. Liu, S. Xu and Y. Qian, Acc. Chem. Res. 33, 457 (2000);
16. S. Kramer, R. R. Fuierer and C. B. Gorman, Chem. Rev. 103, 4367 (2003).
17. R. D. Piner, J. Zhu, F. Xu, S. Hong and C. A. Mirkin, Science 283, 661 (1999);
18. C. A. Mirkin, Mater. Res. Soc. Bull. 26, 535 (2001).
19. S. Hong and C. A. Mirkin, Science 288, 1808 (2000);
20. S. Hong, J. Zhu and C. A. Mirkin, Science 286, 523 (1999);
21. D. S. Ginger, H. Zhang and C. A. Mirkin, Angew. Chem. Int. Ed. 43, 30 (2004).
22. K.-B. Lee, S.-J. Park, C. A. Mirkin, J. C. Smith and M. Mrksich, Science 295, 1702 (2002);
23. R. McKendry, W. T. S. Huck, B. Weeks, M. Fiorini, C. Abell and T. Rayment, Nano Lett. 2, 713 (2002);
24. L. M. Deniers and C. A. Mirkin, Angew. Chem. Int. Ed. 40, 3069 (2001);
25. X. Liu, L. Fu, S. Hong, V. P. Dravid and C. A. Mirkin, Adv. Mater. 14, 231 (2002).
26. A. Noy, A. E. Miller, J. E. Klare, B. L. Weeks, B. W. Woods and J. DeYoreo, Nano Lett. 2, 109 (2002).
27. M. Su and V. P. Dravid, Appl. Phys. Lett. 80, 4436 (2002).
28. T. Teranishi and M. Miyake, Chem. Mater. 10, 54 (1998);
29. T. Teranishi, H. Hori and M. Miyake, J. Phys. Chem. B 101, 5774 (1997).
30. P. J. Thomas, G. U. Kulkarni and C. N. R. Rao, J. Phys. Chem. B 105, 2515 (2001).
31. P. J. Thomas, G. U. Kulkarni and C. N. R. Rao, Chem. Phys. Lett. 321, 163 (2000).
32. D. G. Duff, A. Baiker and P. P. Edwards, Langmuir 9, 2301 (1993);
33. D. G. Duff, A. Baiker and P. P. Edwards, Langmuir 9, 2310 (1993);
34. K. V. Sarathy, G. U. Kulkarni and C. N. R. Rao, Chem. Commun., 537 (1997).
35. A. T. Ngo and M. P. Pileni, J. Phys. Chem. B 105, 53 (2001).
36. H. Meyssamy, K. Riwotzki, A. Kornowski, S. Naused and M. Haase, Adv. Mater. 11, 840 (1999).
37. P. J. Thomas, M. Rajamathi, P. V. Vanitha, G. U. Kulkarni and C. N. R. Rao, J. Nanosci. Nanotech. 5, 565 (2005).
38. Digital Instruments, Santa Barbara, CA.
39. A. Locatelli, A. Bianco, D. Cocco, S. Cherifi, S. Heun, M. Marsi, A. Pasqualetto and E. Bauer, J. Phys. IV 104, 99 (2003).
40. T. Schmidt, S. Heun, J. Slezak, J. Diaz, K. C. Prince, G. Lilienkamp and E. Bauer, Surf. Rev. Lett. 5, 1287 (1998).