Hall mobility measurements and chemical stability of ultrathin, methylated Si(111)-on-insulator films

Journal of Physical Chemistry C

Volumn 112, Issue 13, 2008, Pages 5185-5189

  Green, Jonathan E ^a   Wong, Shelley J ^a   Heath, James R ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INSULATOR FILMS; MOBILITY MEASUREMENTS; SI (111);

CHEMICAL PROPERTIES; ELECTRONIC PROPERTIES; GALVANOMAGNETIC EFFECTS; HALL EFFECT; HALL MOBILITY; MAGNETIC FIELD EFFECTS; SILICON; ULTRATHIN FILMS;

CHEMICAL STABILITY;

EID: 47249141344     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp710482t     Document Type: Article

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