A new route to the production and nanoscale patterning of highly smooth, ultrathin zirconium oxide films

ACS Nano

Volumn 2, Issue 4, 2008, Pages 643-650

  Watson, Scott M D ^a   Coleman, Karl S ^a   Chakraborty, Amit K ^a  

^a DURHAM UNIVERSITY   (United Kingdom)

Author keywords

AFM; Langmuir Blodget; Nanodisplacement; Nanoscale patterning; Nanoshaving; Ultrathin films; Zirconium oxide

Indexed keywords

ANNEALING; EXTREME ULTRAVIOLET LITHOGRAPHY; LANGMUIR BLODGETT FILMS; LITHOGRAPHY; METAL RECOVERY; METALS; NANOSTRUCTURED MATERIALS; OXIDES; SELF ASSEMBLY; THICK FILMS; ULTRATHIN FILMS; VAPOR DEPOSITION; ZIRCONIA; ZIRCONIUM;

AMERICAN CHEMICAL SOCIETY (ACS); ATOMIC FORCE MICROSCOPE (AFM); BI LAYERS; BI-LAYERS; LANGMUIR BLODGETT DEPOSITION; NANOMETRE SCALE; NANOSCALE PATTERNING; OXIDIZED SILICON; SELECTIVE REMOVAL; SELF-ASSEMBLY; ZIRCONIUM OXIDE FILMS;

OXIDE FILMS;

NANOMATERIAL; PHOSPHONIC ACID DERIVATIVE; ZIRCONIUM; ZIRCONIUM OXIDE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHOSPHONIC ACIDS; SURFACE PROPERTIES; ZIRCONIUM;

EID: 46849120606     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn700138q     Document Type: Article

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51. If the tip radius is assumed to be 20 nm, a displacement force of 40 nN corresponds to a pressure of 31.8 MPa.