Controlled growth of ternary alloy nanowires using metalorganic chemical vapor deposition

Nano Letters

Volumn 8, Issue 5, 2008, Pages 1386-1392

  Lim, Sung K ^a   Tambe, Michael J ^a   Brewster, Megan M ^a   Gradečak, Silvija ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

[A] GROWTH MODELS; AL COMPOSITIONS; APPLICATION RANGES; COMPOSITIONAL DIFFERENCES; CONTROLLED GROWTHS; CORE-SHELL STRUCTURES; DECOMPOSITION RATES; ENERGY DISPERSIVE X-RAY SPECTROSCOPIES; HIGH TEMPERATURES; METAL-ORGANIC CHEMICAL VAPOR DEPOSITIONS; NANOWIRE HETEROSTRUCTURES; V/III RATIOS;

ALUMINUM; ELECTRIC WIRE; GALLIUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING ALUMINUM COMPOUNDS; TERNARY ALLOYS; TERNARY SYSTEMS; TRANSMISSION ELECTRON MICROSCOPY; VAPORS;

NANOWIRES;

ALLOY; METAL; NANOMATERIAL; ORGANIC COMPOUND;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; GAS; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

ALLOYS; CRYSTALLIZATION; GASES; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; METALS; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; ORGANIC CHEMICALS; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 46749144622     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl080129n     Document Type: Article

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