Functional metal oxide coatings by molecule-based thermal and plasma chemical vapor deposition techniques

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 5, 2008, Pages 2597-2603

  Mathur, S ^a   Ruegamer, T ^a   Donia, N ^a   Shen, H ^a  

^a INM LEIBNIZ INSTITUTE FOR NEW MATERIALS   (Germany)

Author keywords

Metal oxide; Molecule based CVD; Nanostructured films; Precursors

Indexed keywords

COMPLEX COMPOSITIONS; FUNCTIONAL COATINGS; GRAIN SIZES; GRAIN-SIZE DISTRIBUTION (GSD); INDUSTRIAL PROCESSING; KINETICS OF NUCLEATION; LOW PRESSURE (LP); METAL OXIDE COATINGS; METAL OXIDES; MOLECULAR PRECURSORS; OXIDE MATERIALS; PLASMA CHEMICAL VAPOR DEPOSITION (PECVD); PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); THIN FILM GROWTH;

AGRICULTURAL PRODUCTS; FILM GROWTH; GRAIN GROWTH; GRAIN SIZE AND SHAPE; GROWTH KINETICS; IRON; IRON OXIDES; LIQUID PHASE EPITAXY; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; METALLIZING; MOLECULAR BEAM EPITAXY; MOLECULES; OXIDE FILMS; PLASMA DEPOSITION; PLASMAS; PROCESS CONTROL; PROTECTIVE COATINGS; SIZE DISTRIBUTION; SOLIDS; THICK FILMS; THIN FILMS; VAPOR DEPOSITION; VAPORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 45849124996     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.633     Document Type: Conference Paper

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