RTA and stoichiometry effect on the thermochromism of VO2 thin films

Thin Solid Films

Volumn 286, Issue 1-2, 1996, Pages 219-222

  Lee, Moon Hee ^a   Kim, Myoung Geun ^a  

^a Suwon University   (South Korea)

Author keywords

Annealing; Physical vapour deposition (PVD); Rutherford backscattering spectroscopy; Vanadium oxide

Indexed keywords

ANNEALING; CRYSTALLIZATION; OXIDES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; VANADIUM COMPOUNDS; VAPOR DEPOSITION;

PHYSICAL VAPOR DEPOSITION; RAPID THERMAL ANNEALING; STOICHIOMETRIC VANADIUM OXIDE; THERMOCHROMISM;

THIN FILMS;

EID: 0030232151     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08536-7     Document Type: Article

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