Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications

Journal of Solid-State Devices and Circuits

Volumn 6, Issue 1, 1998, Pages 1-6

  Verdonck, Patrick ^a   Mansano, Ronaldo D ^a   Maciel, Homero S ^a   Salvadori, Maria Cecilia B S ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; MASKS; MICROMACHINING; OXYGEN; PLASMA ETCHING; REACTIVE ION ETCHING; SILICA; SULFUR COMPOUNDS; SURFACE ROUGHNESS;

DEEP TRENCH ETCHING; MICROMASKS; SULFUR HEXAFLUORIDE;

SILICON WAFERS;

EID: 0031988360     PISSN: 01049631     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)