Roughness and chemistry of silicon and polysilicon surfaces etched in high-density plasma: XPS, AFM and ellipsometry analysis

Applied Surface Science

Volumn 164, Issue 1-4, 2000, Pages 147-155

  Rolland, Laëtitia ^a   Vallée, Christophe ^a   Peignon, Marie Claude ^a   Cardinaud, Christophe ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

AFM; Ellipsometry analysis; XPS

Indexed keywords

EID: 0034276015     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00334-2     Document Type: Article

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