Cleaning aluminum fluoride coatings from plasma reactor walls in SiCl 4/Cl2 plasmas

Plasma Sources Science and Technology

Volumn 16, Issue 4, 2007, Pages 711-715

  Ramos, R ^a,b   Cunge, G ^b   Pelissier, B ^b   Joubert, O ^b  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; DRIFT CHAMBERS; FREE RADICALS; PLASMA ETCHING; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM FLUORIDE COATINGS; FLUORINE CHEMISTRIES; PARTICLE GENERATION; PLASMA REACTOR WALLS;

PLASMA DEVICES;

EID: 36448993978     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/16/4/004     Document Type: Article

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