Stoichiometry dependence of hardness, elastic properties, and oxidation resistance in TiN/SiNx nanocomposites deposited by a hybrid process

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1229-1234

  Haug, F J ^a   Schwaller, P ^a   Wloka, J ^a,d   Patscheider, J ^a   Karimi, A ^b   Tobler, M ^c  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b EPFL   (Switzerland)

^c No 1 Industrial Estate   (Switzerland)

^d UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC COLLISIONS; FULL WIDTH AT HALF MAXIMUM (FWHM); REACTIVE SPUTTER PROCESSES; UNBALANCED MAGNETRON (UBM) SPUTTERING;

ALUMINUM COMPOUNDS; DATA ACQUISITION; ELECTRON EMISSION; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; OXIDATION RESISTANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING BORON; SEMICONDUCTOR DOPING; SILICON; STOICHIOMETRY; TITANIUM; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOSTRUCTURED MATERIALS;

EID: 4344629553     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1763907     Document Type: Article

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