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Volumn 348, Issue 1, 1999, Pages 210-214
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Effect of silicon addition on microstructure and mechanical property of titanium nitride film prepared by plasma-assisted chemical vapor deposition
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ADDITION REACTIONS;
GASES;
MECHANICAL PROPERTIES;
METALLOGRAPHIC MICROSTRUCTURE;
MICROHARDNESS;
MIXTURES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON;
STEEL;
SUBSTRATES;
TITANIUM NITRIDE;
GASEOUS MIXTURE;
GRAIN SIZE REFINEMENT;
HIGH SPEED STEEL SUBSTRATES;
NANOSIZED PRECIPITATES;
RANDOMLY ORIENTED MICROSTRUCTURE;
THIN FILMS;
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EID: 0032676642
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(99)00143-1 Document Type: Article |
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Times cited : (36)
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References (15)
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