Thermal stability studies of atmospheric plasma deposited siloxane films deposited on Vycor™ glass

Surface and Coatings Technology

Volumn 202, Issue 17, 2008, Pages 4130-4136

  Ramamoorthy, Amsarani ^a   Rahman, Mahfujur ^a   Mooney, Damian A ^a   Don MacElroy, J M ^a   Dowling, Denis P ^a  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

Atmospheric plasma; Particulates; Siloxane films; Surface roughness; Thermal stability

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL PROPERTIES; FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; HEAT TREATMENT; PARTICLE SIZE; SILICON COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATMOSPHERIC PLASMA; COATING CHEMISTRY; SILICON SUBSTRATES; SILOXANE FILMS;

PLASMA DEPOSITION;

CHEMICAL ANALYSIS; CHEMICAL PROPERTIES; FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; HEAT TREATMENT; PARTICLE SIZE; PLASMA DEPOSITION; SILICON COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 43249126997     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.03.003     Document Type: Article

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