A nonequilibrium, atmospheric-pressure argon plasma torch for deposition of thin silicon dioxide films

Chemical Vapor Deposition

Volumn 13, Issue 4, 2007, Pages 169-175

  Kasih, Tota Pirdo ^a   Kuroda, Shin Ichi ^a   Kubota, Hitoshi ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

Argon plasma torch; Nonequilibrium atmospheric pressure plasma; OES; SiO 2 film

Indexed keywords

ARGON; ATMOSPHERIC PRESSURE; ATMOSPHERICS; DISCHARGE (FLUID MECHANICS); ELECTRIC DISCHARGES; GAS SUPPLY; GASES; HELIUM; INERT GASES; INJECTION (OIL WELLS); INORGANIC COATINGS; OXYGEN; PLASMA DEPOSITION; PLASMA JETS; PLASMA TORCHES; PLASMAS; POWER QUALITY; QUENCHING; SILICA; SILICON COMPOUNDS;

AR PLASMAS; ARGON PLASMA TORCH; ARGON PLASMAS; DISCHARGE TEMPERATURES; GAS COMPOSITIONS; HEXAMETHYLDISILOXANE; NONEQUILIBRIUM; NONEQUILIBRIUM ATMOSPHERIC PRESSURE PLASMA; OES; OXYGEN CARRIERS; QUENCHING EFFECTS; SILICON DIOXIDE FILMS; SIO 2 FILM; VISUAL QUALITIES; VOLTAGE POWER SUPPLIES; WORKING GASSES;

PLASMA DIAGNOSTICS;

EID: 41749100746     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200606535     Document Type: Article

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