Deposition of silicon dioxide films with an atmospheric-pressure plasma jet

Plasma Sources Science and Technology

Volumn 7, Issue 3, 1998, Pages 286-288

  Babayan, S E ^a   Jeong, J Y ^a   Tu, V J ^a   Park, J ^b   Selwyn, G S ^b   Hicks, R F ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; DIELECTRIC FILMS; ELECTRODES; FILM GROWTH; HELIUM; INFRARED SPECTROSCOPY; OXYGEN; PLASMA JETS; PLASMA SOURCES; SILANES; SILICA;

TETRAETHOXYSILANES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0032140139     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/7/3/006     Document Type: Article

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