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Volumn , Issue , 2005, Pages 214-218

Deposition of functional coatings using an in-Line atmospheric pressure plasma apparatus

Author keywords

Atmospheric plasma; Hydrophilic and hydrophobic coatings; Plasma polymerization,; Web coating applications

Indexed keywords

ATMOSPHERIC PRESSURE; ELECTRODES; PLASMA POLYMERIZATION; POLYETHYLENE TEREPHTHALATES; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33644971353     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (13)

References (16)
  • 1
    • 0031560742 scopus 로고    scopus 로고
    • Plasma polymer deposition from mixture of tetramethoxysilane and oxygen on PET films and their oxygen gas barrier properties
    • N. Inagaki, S. Tasaka and M. Makino, "Plasma polymer deposition from mixture of tetramethoxysilane and oxygen on PET films and their oxygen gas barrier properties", J. Appl. Polym. Sci., 64, 1031, 1997.
    • (1997) J. Appl. Polym. Sci. , vol.64 , pp. 1031
    • Inagaki, N.1    Tasaka, S.2    Makino, M.3
  • 2
    • 33644972538 scopus 로고    scopus 로고
    • U.S. Pat. #5,721,027, "Package possessing superior barrier properties", Feb 24
    • P. Frisk, B. Jaccoud, A. Roulin and H. Johansson, U.S. Pat. #5,721,027, "Package possessing superior barrier properties", Feb 24, 1998.
    • (1998)
    • Frisk, P.1    Jaccoud, B.2    Roulin, A.3    Johansson, H.4
  • 3
    • 33644969476 scopus 로고    scopus 로고
    • U.S. Pat. #5,916,685, "Transparent high barrier multilayer structure", June 29
    • P. Frisk, U.S. Pat. #5,916,685, "Transparent high barrier multilayer structure", June 29, 1999.
    • (1999)
    • Frisk, P.1
  • 5
    • 0025830671 scopus 로고
    • Plasma-induced surface modifications on suicone intraocular lenses: Chemical analysis and in vitro characterization
    • H.-J. Hettlich, F. Otterback, C. Mittermoyer, R. Kaufmann, and D. Klee, "Plasma-induced surface modifications on suicone intraocular lenses: chemical analysis and in vitro characterization", Biomaterials, 12(5), 521, 1991.
    • (1991) Biomaterials , vol.12 , Issue.5 , pp. 521
    • Hettlich, H.J.1    Otterback, F.2    Mittermoyer, C.3    Kaufmann, R.4    Klee, D.5
  • 6
    • 33644987988 scopus 로고    scopus 로고
    • U.S. Pat. #5,616,338, "Infection-resistant compositions, medical devices and surfaces and methods for preparing and using same", April 1
    • C.L. Fox, S.M. Modak and L.A. Sampath, U.S. Pat. #5,616,338, "Infection-resistant compositions, medical devices and surfaces and methods for preparing and using same", April 1, 1997.
    • (1997)
    • Fox, C.L.1    Modak, S.M.2    Sampath, L.A.3
  • 7
    • 33644977820 scopus 로고
    • U.S. Pat. #5,098,745, "Method of protecting an automobile finish", March 24
    • N. Gordon, U.S. Pat. #5,098,745, "Method of protecting an automobile finish", March 24, 1992.
    • (1992)
    • Gordon, N.1
  • 8
    • 33644984032 scopus 로고    scopus 로고
    • U.S. Pat. #5,760,109, "Waterbase organopolysiloxane composition", June 2
    • Y. Inokuchi, S. Kuwata, U.S. Pat. #5,760,109, "Waterbase organopolysiloxane composition", June 2, 1998.
    • (1998)
    • Inokuchi, Y.1    Kuwata, S.2
  • 9
    • 33644972395 scopus 로고
    • U.S. Pat. #4,223,048, "Plasma enhanced chemical vapor processing of semiconductive wafers", Sept 16
    • G.M. Engle, U.S. Pat. #4,223,048, "Plasma enhanced chemical vapor processing of semiconductive wafers", Sept 16, 1980.
    • (1980)
    • Engle, G.M.1
  • 10
    • 33644986280 scopus 로고
    • U.S. Pat. #4,877,651, "Process for thermally depositing silicon nitride and silicon dioxide films onto a substrate", Oct 31
    • T.S. Dory, U.S. Pat. #4,877,651, "Process for thermally depositing silicon nitride and silicon dioxide films onto a substrate", Oct 31, 1989.
    • (1989)
    • Dory, T.S.1
  • 11
    • 33644975919 scopus 로고
    • U.S. Pat. #5,068,124, "Method for depositing high quality silicon dioxide by PECVD", Nov 26
    • J. Batey and E. Tierney, U.S. Pat. #5,068,124, "Method for depositing high quality silicon dioxide by PECVD", Nov 26, 1991.
    • (1991)
    • Batey, J.1    Tierney, E.2
  • 12
    • 0025451714 scopus 로고
    • Reaction mechanisms of Plasma and thermal-assisted chemical vapor deposition of tetraethylorthosilicate oxide films
    • S. Nguyen, D. Dobuzinsky, D. Harmon, R. Gleason and S. Fridman, "Reaction Mechanisms Of Plasma And Thermal-Assisted Chemical Vapor Deposition Of Tetraethylorthosilicate Oxide Films", J. Electrochem. Soc., 137(7), 2209, 1990.
    • (1990) J. Electrochem. Soc. , vol.137 , Issue.7 , pp. 2209
    • Nguyen, S.1    Dobuzinsky, D.2    Harmon, D.3    Gleason, R.4    Fridman, S.5
  • 13
    • 0032654691 scopus 로고    scopus 로고
    • Micro-scratch analysis and mechanical properties of plasma-deposited silicon-based coatings on polymer substrates
    • D. Rats, V. Hajek and L. Martinu, "Micro-scratch analysis and mechanical properties of plasma-deposited silicon-based coatings on polymer substrates", Thin Solid Films, 340(1), 33, 1999.
    • (1999) Thin Solid Films , vol.340 , Issue.1 , pp. 33
    • Rats, D.1    Hajek, V.2    Martinu, L.3
  • 15
    • 0034539135 scopus 로고    scopus 로고
    • Preparation of oxygen gas barrier polypropylene films by deposition of SiOx films plasma-polymerized from mixture of tetramethoxysilane and oxygen
    • N. Inagaki, S. Tasaka, and T. Nakajima, "Preparation of oxygen gas barrier polypropylene films by deposition of SiOx films plasma-polymerized from mixture of tetramethoxysilane and oxygen", Journal of applied polymer science, 78(13), 2389, 2000.
    • (2000) Journal of Applied Polymer Science , vol.78 , Issue.13 , pp. 2389
    • Inagaki, N.1    Tasaka, S.2    Nakajima, T.3
  • 16
    • 6344287341 scopus 로고    scopus 로고
    • Development of a methodology for XPS curve-fitting of the Si 2p core level of siloxane materials
    • L.A. O'Hare, B. Parbhoo and S.R. Leadley, "Development of a Methodology for XPS Curve-Fitting of the Si 2p Core Level of Siloxane Materials," Surf Interface Anal, 36, 1427, 2004.
    • (2004) Surf Interface Anal , vol.36 , pp. 1427
    • O'Hare, L.A.1    Parbhoo, B.2    Leadley, S.R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.