Effects of rapid thermal annealing on ripple growth in excimer laser-irradiated silicon-dioxide/silicon substrates

Applied Surface Science

Volumn 154, Issue , 2000, Pages 670-674

  Yu, J J ^a   Lu, Y F ^a  

^a DATA STORAGE INSTITUTE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; EXCIMER LASERS; LASER BEAM EFFECTS; MATHEMATICAL MODELS; RAPID THERMAL ANNEALING; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS; SPUTTERING; SURFACE PHENOMENA; SURFACE TOPOGRAPHY; THERMAL EFFECTS;

RIPPLE GROWTH;

SEMICONDUCTING FILMS;

EID: 0033871947     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00418-3     Document Type: Article

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