Particle generation and thin film surface morphology in the tetraethylorthosilicate/oxygen plasma enhanced chemical vapor deposition process

Journal of Applied Physics

Volumn 88, Issue 5, 2000, Pages 3047-3052

  Fujimoto, Toshiyuki ^a   Okuyama, Kikuo ^a   Shimada, Manabu ^a   Fujishige, Yousuke ^a   Adachi, Motoaki ^b   Matsui, Isao ^c  

^a HIROSHIMA UNIVERSITY   (Japan)

^b Osaka Prefecture University   (Japan)

^c TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DOMES; LIGHT SCATTERING; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE MORPHOLOGY; THIN FILMS;

DOME-LIKE STRUCTURES; EXPERIMENTAL CONDITIONS; GAS-PHASE NUCLEATION; HIGHLY CONCENTRATED PARTICLES; LASER LIGHT SCATTERING; RADIO FREQUENCY PLASMA REACTORS; TETRA-ETHYL-ORTHO-SILICATE; TETRAETHYL ORTHOSILICATES;

MORPHOLOGY;

EID: 0001515056     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.1287783     Document Type: Article

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