SiO2 thin film deposition on the inner surface of a poly(tetra-fluoroethylene) narrow tube by atmospheric-pressure glow microplasma

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1394-1399

  Yoshiki, Hiroyuki ^a   Abe, Kazunori ^a   Mitsui, Toshiaki ^b  

^a TSURUOKA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b YAMAGATA RESEARCH INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Glow discharge; Plasma processing and deposition; Polymers; Silicon oxide

Indexed keywords

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

GLOW MICROPLASMA; RADIO FREQUENCY (RF) CAPACITIVELY COUPLED DISCHARGE; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 33750817872     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.060     Document Type: Article

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