Temperature-dependent Hall effect studies of ZnO thin films grown by metalorganic chemical vapour deposition

Semiconductor Science and Technology

Volumn 23, Issue 5, 2008, Pages

  Roro, K T ^a   Kassier, G H ^b   Dangbegnon, J K ^a   Sivaraya, S ^a   Westraadt, J E ^a   Neethling, J H ^a   Leitch, A W R ^a   Botha, J R ^a  

^a NELSON MANDELA METROPOLITAN UNIVERSITY   (South Africa)

^b STELLENBOSCH UNIVERSITY   (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; HALL EFFECT; METALLORGANIC CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC OXIDE;

GLASS SUBSTRATE; GRAIN BOUNDARY SCATTERING; TEMPERATURE RANGE; TEMPERATURE-DEPENDENT HALL-EFFECT;

THIN FILMS;

EID: 43149104377     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/23/5/055021     Document Type: Article

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