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Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 2, 2008, Pages 563-565

Effect of deposition conditions on the growth rate and electrical properties of ZnO thin films grown by MOCVD

(3) Roro, K T a Botha, J R a Leitch, A W R a

a NELSON MANDELA METROPOLITAN UNIVERSITY (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

COMPETITIVE ADSORPTION; DEPOSITION CONDITIONS; ELECTRICAL PROPERTY; GASPHASE; GLASS SUBSTRATES; GROWTH SURFACES; HIGH PRESSURE; MOCVD; MOLAR RATIO; OXYGEN SPECIES; PRE-REACTIONS; REACTANT SPECIES; REACTOR PRESSURES; ZNO THIN FILM;

ADSORPTION; CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC PROPERTIES; METALLIC FILMS; OPTICAL FILMS; OXYGEN; PRESSURE EFFECTS; SUBSTRATES; THIN FILMS; ZINC; ZINC OXIDE;

GROWTH RATE;

EID: 43149121832 PISSN: 18626351 EISSN: 16101642 Source Type: Journal
DOI: 10.1002/pssc.200776827 Document Type: Conference Paper

Times cited : (3)

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