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Volumn 70, Issue 15, 2004, Pages

Below-band-gap electroluminescence related to doping spikes in boron-implanted silicon pn diodes

Author keywords

[No Author keywords available]

Indexed keywords

BORON; SILICON;

EID: 42749105483     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.155316     Document Type: Article
Times cited : (31)

References (39)
  • 39
    • 0000115711 scopus 로고
    • The local strain around a three dimensional, finite nanostructure (interstitial cluster, extended defect) will most likely contain contributions from all possible strain components (hydrostatic, uniaxial, shear). However, since in silicon virtually all contributions lead to a smaller band gap, there will be always some local minimum for electrons and maximum for holes. A very detailed discussion of uniaxial strain in Si along the main crystallographic directions can be found in L.D. Laude, F.H. Pollak, and M. Cardona, Phys. Rev. B 3, 2623 (1971).
    • (1971) Phys. Rev. B , vol.3 , pp. 2623
    • Laude, L.D.1    Pollak, F.H.2    Cardona, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.