Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates

Thin Solid Films

Volumn 516, Issue 15, 2008, Pages 4855-4862

  Jõgi, Indrek ^a   Pärs, Martti ^a   Aarik, Jaan ^a   Aidla, Aleks ^a   Laan, Matti ^a   Sundqvist, Jonas ^b   Oberbeck, Lars ^b   Heitmann, Johannes ^b   Kukli, Kaupo ^a  

^a UNIVERSITY OF TARTU   (Estonia)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

Author keywords

Atomic layer deposition; Chemical composition; Crystal structure; Nanostructures; Titanium oxide

Indexed keywords

ASPECT RATIO; ATOMIC LAYER DEPOSITION; CONFORMATIONS; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; SILICON WAFERS; TITANIUM OXIDES;

CHEMICAL COMPOSITION; CONFORMAL GROWTH; ELLIPTICAL HOLES; PLANAR WAFERS; SILICON SUBSTRATES; TITANIUM PRECURSORS;

OXIDE FILMS;

EID: 42649142617     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.09.008     Document Type: Article

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