Variation of electrical characteristics of metallorganic chemical vapor deposited TiO2 films by postmetallization annealing

Journal of the Electrochemical Society

Volumn 152, Issue 11, 2005, Pages

  Lee, Ming Kwei ^a   Huang, Jung Jie ^a   Hung, Yu Hsiang ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC FIELD EFFECTS; FILM GROWTH; GRAIN BOUNDARIES; HYSTERESIS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; METALLIZING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; REDUCTION;

INTERFACE STATE DENSITIES; OXYGEN VACANCY; POSTMETALLIZATION ANNEALING; TITANIUM OXIDE FILMS;

TITANIUM DIOXIDE;

EID: 27944456522     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2048187     Document Type: Article

References (16)

1. Q. X. Jia, L. H. Chang, and W. A. Anderson, Thin Solid Films, 259, 264 (1995).
2. Y. H. Lee, K. K. Chan, and M. J. Brady, J. Vac. Sci. Technol. A, 13, 596 (1995).
3. K. Vydianathan, G. Nuesca, G. Peterson, E. T. Eisenbraun, A. E. Kaloyeros, J. J. Sullivan, and B. Han, J. Mater. Res., 16, 1838 (2001).
4. D. M. Shang and W. Y. Ching, Phys. Rev. B, 51, 13023 (1995).
5. D. C. Gilmer, X. C. Wang, M. T. Hsieh, H. S. Kim, W. L. Glasfelter, and J. Yan, IEEE Trans. Electron Devices, 44, 104 (1997).
6. E. H. Nicollian and J. R. Brews, MOS (Metal Oxide Semiconductor) Physics and Technology, Chap. 15, Wiley, New York (1982).
7. E. K. Badih and J. B. Richard, Introduction to VLSI Silicon Device Physics, Technology and Characterization, pp. 340-341, Kluwer Academic Publishers, Norwell, MA (1986).
8. M. L. Reed and J. D. Plummer, J. Appl. Phys., 63, 5776 (1988).
9. N. Rausch and E. P. Burte, Engineering, 19, 725 (1992).
10. W. D. Brown and W. W. Grannemann, Solid-State Electron., 21, 837 (1978).
11. M. K. Lee, J. J. Huang, and T. S. Wu, Semicond. Sci. Technol., 20, 519 (2005).
12. L. M. Terman, Solid-State Electron., 5, 284 (1962).
13. M. Hiratani, M. Kadoshima, T. Hirano, Y. Shimamoto, Y. Matsui, T. Nabatame, K. Torii, and S. Kimura, Appl. Surf. Sci., 207, 13 (2003).
14. C. K. Jung, D. C. Lim, H. G. Jee, M. G. Park, S. J. Ku, K. S. Yu, B. Hong, S. B. Leea, and J. H. Booa, Surf. Coat. Technol., 171, 46 (2003).
15. H. D. Fuchs, M. Stutzman, M. S. Brandt, M. Rosenbauer, J. Weber, A. Breitschwerd, P. Deak, and M. Cardona, Phys. Rev. B, 48, 8172 (1993).
16. K. Vydianathan, G. Nuesca, G. Peterson, E. T. Eisenbraun, A. E. Kaloyeros, J. J. Sullivan, and B. Han, J. Mater. Res., 16, 1838 (2001).